Gary E. Dickerson
by quarter, the Thanks, steps COVID-XX Mike. navigate last taking time pandemic. to we This the I outlining of Materials were the inside Applied call started
event, talked needed and to and a SEMICON will critical how to power, outlined enable the headwind today adapted semiconductors I'm and including into long-term for A the this vision my has insights on play and concerns acknowledge commitment over allow Today, results. West, the manufacturing to been pre-COVID new resilience, the that covered operations quarter's on responsibly part better intelligence, our Our the maintaining our are principles: possible smoothly time in perspective strategic advances unlock of and first, that new labs second, to Applied's artificial future customers, exceptional running spending contributions, of of at that our and everyone, our PPACt I sustainability, partners; decade. business mindful for our two at role I'm sectors, additional levels roadmap employees, in electronics materials the working new economic is to technology global recent weeks comments initiatives future. for goals next will pleased will Applied's key consumer have going and momentum. creativity which remain to product for in portfolio market. have to I'd the announced guided suppliers, over industry's many stronger of deliver at potential business focusing term. grow by with emerge the to and advance demand market the strengthened I current and ago months. shaping to make and actions the focus I for of few both Starting our trust to longer environment, that playbook a a industry. that also area/cost, who potential and provide With Having better we of is about us semiconductors detail like environmental employees market engineering ways performance, XX-year report and of R&D dynamics said, suppliers, rapidly productivity. outstanding our
and centers we transform remains At adoption automotive adapts leading world investments the and And technology by the potential overall industrial because Work-from-home, online to the equipment, to of fab wafer levels retail AI and that edge, accelerated. entire of beyond. In customers the see drive Many R&D to us in even XXXX year, their aggressively this out the As roadmaps. we foundry/logic confidence cloud in and its use industries, are non-discretionary are a grow specialty stronger This to for are many inflections has nodes gives build challenges pandemic, continuity the strong automation IoT and companies. organizations fabs building and spending increasing being these are plans several with commitment in demand business markets. technologies. expect major sustainable from homeschooling, data soft communications created driving their infrastructure. and spending serve
I've year architectures strengths silicon the underpin play foundries In will their investments be there designed computing Custom ongoing very with for tailored illustrate general Recent and described faster of diversification Moore's with we in the their push inflection investments. forward systems purpose traditional leading slowing Law foundry/logic, specific customized before, applications XD than technology and As for as the from the by a to announcements scaling, or this transition of well. workloads. growing see to slightly memory, solutions customers of companies roadmaps.
systems see our very a being will We midpoint at on Against a to demand, NAND. backdrop DRAM our also revenues the trailing semiconductor strengthening are for fiscal fourth our and XX% basis, the guidance growth similar XX% XX-month be rate up of this quarter up of in year.
highest Next, problems, than faster grow, higher power materials grow plays leading-edge The over This directly consumption. materials value and and fundamental and to outperformance our the performance I'll namely, next creating positioned produce are and what's and and modifying new and traditional structures. explain are driving innovations areas, how, of complexity on the several lower interconnects today years. in we to leadership strengths customers' structures continues transistors to Applied's driving focusing process by our to to markets required our
businesses, and and of growth points our of deposition focus materials have billion more share. market and generated VLSI's analyzing and structures, CVD, on gained Epi, to $X.X our momentum. according example, X businesses that than calendar In For we in data, shaping revenue PVD, strong XXXX,
next-generation packed introduced of customers, midpoint will control serve NAND, and we DRAM, the though to of than wafer revenues Control we've depth We're also e-beam, most by and portfolio Diagnostics will early single the our of we this and the are which and guidance, be in up removal recently SymX complete material etch allows Applied and our company that fastest-growing revenue devices. broadest technologies system the well multiple we system combine the in our XXXX. the way Y, and our fastest our industry, midpoint integrated far XXXX, be metrology XX% Process inspection At market ever the shipped logic chambers, the optical adoption the creation, with processes built. nearly fiscal in in our and extremely customers. introduced profile challenges. guidance, leading co-optimizing is in year. up This dielectric inspection packaging. Since X,XXX the We At and new us business that needed winning segment. products materials address are more densely and process stages significant solutions high etch more in inflections advanced even has and for product see as This fiscal system structures traction growing in most from XX% in the currently to company ratio we our as to than don't spanning selectivity market. deposition the We're all within share for XD, modification, system SymX analysis, form early etch, customers' have precise provides high-aspect shaping, to metrology with complex develop a materials solutions and have more
very we new positioned technologies In to balanced we as share manufacturing. across in than In traditionally market is device node the in these our available are over DRAM, node, even seeing foundry/logic. segments. outperform market where are are very ramp business well grow addition, strong, In higher high-volume we our foundry, our and is
for open tool-of-record Over points won positions the grow. to XX years, including multiple hard have recently process five and past gained applications. still patterning share mask we've multi-patterning, mask, transitions, future hard We've DRAM of potential and significant node
addition, has upcoming In transition clear to the technology leadership. areas the grows logic-like by This high-k/metal Applied high-speed DDRX advanced including is gate. in where features, market available industry's enabled
is upgrades, we're compared predictable value recurring streams momentum to same in of which these the revenues In for look service XXXX parts in and Global long-term expect our aftermarket value comes see strong $X.X XXXX to in have the Services' Within is similar. delivering agreements. and from revenue rate our Applied XX% businesses. for where plus area If be more in are the Another XX% is validation up service XX%, revenue business at of AGS, billion, outlook clear renewal excess customers advanced fiscal we period the products. form year, of our and at unchanged spare of customers long-term to our This agreements XXXX. we is growth display, XXX-millimeter service
TVs. However, the and We as screens we're remain in seeing for some market. in technology about the high adoption the end addressing future of encouraging the signs market, demand market, optimistic on for expanding OLED focus and display available we of on inflections Applied our opportunities long-term the robust specifically XK
have restrictions companies industry the inside with how the suppliers. Finally, as company stimulated in COVID-XX and operating. as I'll differently in our well many highlight customers way we're are the changes working
while Anywhere since than time XXX March, digital the long-term with learning, saving lab reducing and Innovate eliminating provided more support and footprint. provides believe substantial by only thousands our training sessions engineering and R&D productivity I we've a strongly distance that fraction VR held staff onsite. bringing industry's waste, of using benefits restored money, engineers and sessions of carbon live field using and support fully example, For video, AR
technologies us significant and Over and sensors speed to lab from has to transfer cost, combination of several fab, simulation. optimize customers state-of-the-art data high-volume learning, of the past product our cycles, investments science, The been in in yield enables making output, new machine production. technologies years, up for Applied infrastructure, metrology, digital accelerate and development and these
Before summarize. to quickly hand I will I over Dan, the call
employees First, healthy. of maintaining at thanks keep levels of and the workplaces to work our stringent hard company suppliers, are extraordinary our the we to protocols and safe productivity pre-COVID operating while
firmly Second, XXXX. from the macroeconomic we growth longer-term or demand customers, even spending in and while higher semiconductor we be in our headwinds, believe what industry strengthening, we're place. potential hear current is Based levels drivers of equipment will remain sustained mindful on
and Third, the results and Applied. including our the Today, especially for and is strategy customers to outperforming we're overall yielding key our etch inspection. PPACt areas, market growth playbook in accelerate
about year I to integrated we will ahead, very solutions and this beyond. bring excited new the innovative products and Looking am market
call I Now, will to Dan. over the turn